金属有机气相外延
材料科学
兴奋剂
发光
光学
光电子学
蓝光
折射率
薄膜
纳米技术
外延
物理
图层(电子)
作者
Zhaolan Sun,Jing Yang,Y. Zhang,Zong Liu,Yufei Hou,Feng Liang,Liwen Liu,Fu Zheng,Xuefeng Liu,Dewei Zhao
出处
期刊:Optics Express
[The Optical Society]
日期:2025-08-20
卷期号:33 (18): 38403-38403
摘要
Aluminum nitride (AlN) has attracted considerable attention for its promising applications in short-wavelength optoelectronic devices. However, undesirable blue and violet luminescence from MOCVD-grown AlN films has impeded their development. This study has experimentally investigated the blue luminescence at 2.7 eV originated from the donor-acceptor pair (DAP) transitions between V Al acceptor and deep donors, and the violet luminescence at 3.0eVoriginated from the transitions between Al(NO y ) x complex and conduction band or shallow donor level. Additionally, incorporating a small amount of Ga into the AlN layer during the growth can modulate the defect types and suppress violet luminescence. This study is crucial for improving the performance of AlN-based optoelectronic devices.
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