Flexible Carbon-rich Al2O3 Interlayers for Moisture Barrier Films by a Spatially-Resolved Atomic Layer Deposition Process

In this study, we developed effective carbon-rich Al 2 O 3 interlayers for flexible moisture barrier films. The carbon-rich Al 2 O 3 films were deposited with excessive supply of trimethylaluminum (TMA) precursor. The five-layer structure was made with alternate layers of low-carbon Al 2 O 3 and carbon-rich Al 2 O 3 and the water vapor transmission rate (WVTR) of 3.3 × 10 −4 g/(m 2 ·day) was demonstrated. The WVTR of the multilayer films is reduced by 36% compared to 25 nm thick single Al 2 O 3 barrier film. The WVTR of the five-layer film shows increase of 86% after 1,000 bending at a 1.5 cm radius, while single Al 2 O 3 thin films increased by 367%.