X射线光电子能谱
密度泛函理论
退火(玻璃)
吸附
铬
材料科学
解吸
氧化态
吸收光谱法
X射线吸收精细结构
超高真空
吸收边
吸收(声学)
分析化学(期刊)
结晶学
物理化学
光谱学
化学
计算化学
纳米技术
金属
冶金
核磁共振
有机化学
光学
物理
复合材料
光电子学
量子力学
带隙
作者
Maya Messaykeh,Jacek Goniakowski,Grégory Cabailh,Jacques Jupille,Rémi Lazzari,P. Lagarde,Nicolas Trcera
标识
DOI:10.1021/acs.jpcc.9b08907
摘要
We address herein the question of the termination of the Al-terminated α-Al2O3(0001) surface. Over decades, various analyses made by different groups repeatedly suggested the presence of a residual coverage of surface OH groups on Al2O3 crystals and powders after annealing in vacuum. However, other authors came to contrary conclusions, thus maintaining a persistent blur on the issue. The present work examines the Cr/alumina interface via a Cr K-absorption edge analysis (extended X-ray absorption fine structure and X-ray absorption near-edge structure) and photoemission with the support of density functional theory (DFT) calculations. Experiments support the presence of surface OH groups to account for the observed environment as well as the oxidation state of Cr adatoms (Cr3+). Following a comprehensive DFT-based analysis of Crz+-OnHm configurations (z = 0–6; n and m = 0–3), the Cr3+-O2H alumina-supported surface moieties are found to successfully fit the X-ray absorption spectroscopy edge calculations. Most importantly, the combination of experiment and theory that is developed unambiguously demonstrates the presence of surface OH groups on α-Al2O3(0001) after annealing in vacuum.
科研通智能强力驱动
Strongly Powered by AbleSci AI