Tunable optical properties of uniform and nanostructured TiN thin films

In this work, TiN uniform thin films and nanostructured thin films were fabricated in a magnetron sputtering system. Two sets of TiN thin films with and without substrate bias were deposited at a nitrogen flow rate varied from 1.2 sccm to 2.0 sccm. The permittivity spectra of TiN films were measured and compared between different deposition conditions. A glancing angle-deposited TiN nanorod array was deposited with substrate bias. The polarization dependent extinction versus wavelength and angle of incidence was measured to discuss the associated transverse and longitudinal plasmonic modes.