材料科学
辐照
跨导
光电子学
电子
晶体管
电子迁移率
伽马射线
扩散
辐射
高电子迁移率晶体管
泄漏(经济)
康普顿散射
光学
电气工程
物理
核物理学
工程类
宏观经济学
经济
电压
热力学
作者
Jonathan Lee,Anupama Yadav,Michael Antia,Valentina Zaffino,Elena Flitsiyan,Leonid Chernyak,J. Salzman,B. Meyler,Shihyun Ahn,F. Ren,S. J. Pearton
标识
DOI:10.1080/10420150.2017.1300903
摘要
The impact of internal irradiation with secondary Compton electrons, generated by gamma-photons, on the characteristics of III-N/GaN-based devices was explored. N-channel AlGaN/GaN high-electron-mobility transistors (HEMTs) were exposed to gamma-radiation from a 60Co source for doses up to 600 Gy. Temperature-dependent electron beam-induced current (EBIC) was employed to measure minority carrier transport properties. For low doses below ∼250 Gy, the minority carrier diffusion length in AlGaN/GaN HEMTs is shown to increase by about 40%. This increase is likely due to longer minority carrier lifetime induced by internal Compton electron irradiation. An associated decrease in activation energy, extracted from temperature-dependent EBIC, was also found. The obtained increase in transconductance and decrease in gate leakage current indicate an improvement in performance of the devices after low doses of irradiation. For high doses of gamma-irradiation, above ∼300 Gy, the performance of HEMTs showed a deterioration. The deterioration results from the onset of increased carrier scattering due to additional radiation-induced defects, as is translated in a decrease of minority carrier diffusion length.
科研通智能强力驱动
Strongly Powered by AbleSci AI