Design of Injection Feed Multiwafer Low‐Pressure Chemical Vapor Deposition Reactors

A two‐dimensional model has been developed for low‐pressure chemical vapor deposition reactors with injection feeding of gas components. The classical methods for linear differential equations are applied to obtain analytical solutions of the model both with and without main gas flow in the system. Analysis of the model reveals a relationship between the reactor geometry and the process parameters for maintaining constant reagent concentration in the system. Injection design is determined by means of simulation study of definite deposition processes.