光学
材料科学
波长
反射计
防反射涂料
光电子学
光学涂层
激光器
涂层
物理
计算机科学
复合材料
计算机视觉
时域
作者
Philipp Naujok,Sergiy Yulin,Anna Bianco,Nicola Mahne,Norbert Kaiser,Andreas Tünnermann
出处
期刊:Optics Express
[Optica Publishing Group]
日期:2015-02-11
卷期号:23 (4): 4289-4289
被引量:21
摘要
In this paper, the authors report on La/B(4)C multilayer mirrors designed for an incidence angle of 45° with both maximum reflectivity at a wavelength of 6.7 nm and reflectivity suppression at a wavelength of 20.1 nm. These mirrors were deposited for the EIS-TIMER at the FERMI@Elettra Free Electron Laser. The multilayer structure and optical properties were characterized using grazing incidence X-ray reflectometry with Cu-K(α) radiation and EUV reflectometry in the spectral region of 6.5 - 21.0 nm. An anti-reflective coating designed at the wavelength of 20.1 nm had to be deposited on top of the high reflective La/B(4)C multilayer mirror optimized at a wavelength of 6.7 nm. Measured reflectivities of 53.4% at the wavelength of 6.72 nm and 0.15% at the wavelength of 20.1 nm were simultaneously achieved. It is shown that the reflectivity loss at the wavelength of 6.7 nm due to the utilization of antireflective coating designed at the wavelength of 20.1 nm can be minimized up to 1.0%.
科研通智能强力驱动
Strongly Powered by AbleSci AI