金属间化合物
群(周期表)
结晶学
位错
极性(国际关系)
锌
化学
蚀刻(微加工)
材料科学
冶金
纳米技术
图层(电子)
有机化学
生物化学
细胞
合金
作者
H. C. Gatos,Mary C. Lavine
摘要
Surface characteristics of the {111} crystallographic planes of the III–V intermetallic compounds (zinc‐blende structure), and in particular those of InSb , are discussed. The polarity of these compounds along the 〈111〉 directions leads to pronounced physical chemical differences between the {111} surfaces terminating with group III atoms and those terminating with group V atoms. Differences in etching, dislocation etch pit formation, and electrode potential are presented. Dislocation etch pits form on the group III surfaces and not on the group V surfaces of the six compounds investigated ( InSb , GaSb , AlSb , InAs , GaAs , and InP ). A proposed interpretation is based on the relative reactivity of the group III and group V atoms as affected by their bond configuration and the polarity of the zinc‐blende structure.
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