硼
兴奋剂
掺杂剂
化学浴沉积
材料科学
带隙
电阻率和电导率
薄膜
硼酸
碲化镉光电
沉积(地质)
分析化学(期刊)
光电子学
纳米技术
化学
电气工程
工程类
古生物学
有机化学
生物
色谱法
沉积物
作者
Jaehyeong Lee,Junsin Yi,Kea-Joon Yang,Joon-Hoon Park,Ryum-Duk Oh
标识
DOI:10.1016/s0040-6090(03)00153-6
摘要
Boron doped CdS films were prepared by chemical bath deposition, which is a low-cost and large-area technique and appears to be well-suited for the manufacture of thin film solar cells, using boric acid (H3BO3) as dopant source, and their properties were investigated as a function of doping concentration. In addition, effects of the boron doping of the CdS films on the characteristics of CdS/CdTe solar cells were investigated. As the boron doping concentration increased, the resistivity of CdS films rapidly decreased and exhibited the lowest resistivity of 2 Ω cm at 0.01 of H3BO3/CdAc2 mole ratio. Boron doping into CdS films improved the optical transmittance in the visible region of light and increased the optical band gap. The photovoltaic characteristics of CdS/CdTe solar cells using boron doped CdS film as the window layer were improved due to the increase of the electrical conductivity and the optical band gap of CdS films.
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