材料科学
单晶硅
碳化硅
透射电子显微镜
堆积
兴奋剂
异质结
高分辨率透射电子显微镜
硅
结晶学
电子显微镜
宽禁带半导体
光电子学
纳米技术
复合材料
光学
化学
物理
有机化学
作者
Hiroshi Iwasaki,Shinji Inoue,Tatsuo Yoshinobu,Masayoshi Tarutani,Yoshizo Takai,Ryuichi Shimizu,Akira Ito,Tsunenobu Kimoto,Hiroyuki Matsunami
摘要
The interface structures of 4H-SiC/6H-SiC heterostructures formed in monocrystalline bulk silicon carbide were studied by high-resolution electron microscopy of cross-sectional specimens. The samples were grown on the (0001̄) C face of a 6H-SiC seed with in situ Ce doping. The observed transition region is atomically flat over regions of several hundreds nm. The transition from the initial 6H-SiC growth to the 4H-SiC growth happens all at once at certain thicknesses with the occurrence of only a few layers of 4H-SiC (6H-SiC) before (after) the transition. The atomic stacking sequence at the interface of the two polytype crystals can be resolved.
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