互易晶格
异质结
电子衍射
材料科学
碲化镉光电
外延
化学气相沉积
俄歇电子能谱
反射高能电子衍射
结晶学
低能电子衍射
金属有机气相外延
薄膜
单晶
基质(水族馆)
光学
光电子学
衍射
化学
纳米技术
图层(电子)
物理
核物理学
地质学
海洋学
作者
Xuegang Chen,Zonghuan Lu,Xixing Wen,Yu Xiang,Ishwara Bhat,Morris Washington,Toh-Ming Lu,Gwo-Ching Wang
标识
DOI:10.1016/j.tsf.2023.139807
摘要
CdTe thin films have drawn continued interest in research and applications in various fields such as optoelectronics. We report on the study of a two-dimensional (2D) reciprocal space map of Br-methanol etched CdTe(001) epitaxial film grown by metalorganic chemical vapor deposition on miscut GaAs(001) using azimuthal reflection high-energy electron diffraction (ARHEED), which reveals a two-fold symmetric surface with a rectangular unit mesh. This is in contrast to the observed four-fold symmetry with a square unit mesh on an etched miscut single crystal CdTe(001). Two sets of two-fold symmetric diffraction spots with unequal intensities indicate unequal populations of two 90° orientation domains in the etched film. Based on the 2D maps and tilted azimuthal dependent RHEED patterns of the etched film, it unveils that the short length of rectangular unit mesh in the dominant domain aligns with the step edge direction. A simple method to characterize the miscut angle of a heteroepitaxial film grown on a miscut substrate is demonstrated using ARHEED. Both etched single crystal and film surfaces are Te rich with a higher Te to Cd ratio on the elongated hillocks in the etched film disclosed by scanning Auger electron spectroscopy mapping. This methodology can be applied to examine etched epitaxial film's surfaces that might deviate from bulk structure or bulk stoichiometry before interfacing with other materials to form heterojunctions or making ohmic contacts with metals.
科研通智能强力驱动
Strongly Powered by AbleSci AI