材料科学
界面热阻
蓝宝石
异质结
热阻
热的
光电子学
宽禁带半导体
扩散
晶体管
边界(拓扑)
凝聚态物理
电压
热力学
光学
电气工程
数学分析
激光器
物理
数学
工程类
作者
К. А. Филиппов,Alexander A. Balandin
出处
期刊:Mrs Internet Journal of Nitride Semiconductor Research
[Materials Research Society]
日期:2003-01-01
卷期号:8
被引量:65
标识
DOI:10.1557/s1092578300000478
摘要
We have calculated the thermal boundary resistance at the GaN/SiC, GaN/sapphire and GaN/AlN interfaces in the diffuse mismatch approximation. The obtained values were then used to examine the effect of the thermal boundary resistance on heat diffusion in AlGaN/GaN heterostructure field-effect transistors. The results show that the thermal boundary resistance at the device layer interfaces can strongly influence the temperature rise in the device channel.
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