Calibrated PSCAR stochastic simulation

Photosensitized Chemically Amplified Resist^TM (PSCAR^TM) has been demonstrated as a promising solution for a high sensitivity resist in EUV lithography mass production. This paper describes the successful calibration of a PSCAR resist model for deployment within rigorous lithography process simulation, capturing continuum as well as stochastic effects. Verification of the calibrated model parameters was performed with new patterns or with new resist formulations with good agreement. The reduction of required EUV dose of PSCAR resist while maintaining similar roughness levels have been achieved both from experimental result and from simulated result. The simulation of PSCAR continues to be a great tool for understanding, predicting, and optimizing the process of PSCAR.