Advanced colloidal lithography: From patterning to applications

This article presents a comprehensive review about the current research activities on colloidal lithography, a highly efficient technology for fabricating large-area patterned functional nanostructures. Three aspects are elaborated: i) self-assembly of monolayer of colloidal crystals (MCCs) and their modifications; ii) lithographic patterning methods, including deposition and patterning of functional materials and pattern transfer onto the underlying substrates; iii) promising applications, especially in the optical and photonic-related fields in the past several years. Finally, perspectives on the current challenges and future trends in this area are given. The present review intends to inspire more ingenious designs and exciting research in colloidal lithography for advanced nanofabrication.