Enhanced synergistic performance of g-C3N4/MoS2 with hollow structure for tetracycline photocatalytic degradation in complex environments: Performance and mechanism

光催化 四环素 降级(电信) 异质结 化学 吸附 金属 污染物 废水 化学工程 材料科学 核化学 光化学 催化作用 有机化学 环境工程 抗生素 光电子学 计算机科学 电信 生物化学 工程类
作者
Junfei Liu,Yingbo Dong,Yue Zhang,Wei Liu,Jian Xu,Hai Lin
出处
期刊:Journal of Cleaner Production [Elsevier]
卷期号:451: 141983-141983 被引量:33
标识
DOI:10.1016/j.jclepro.2024.141983
摘要

The toxicity of antibiotic and heavy metal combined pollutants is greater than single antibiotic, achieving its synergistic removal is the key. In this work, a novel g-C3N4/MoS2 photocatalyst with hollow structure (CN/MS-V-3) was fabricated by one-step solvothermal method. As expected, CN/MS-V-3 showed an outstanding removal efficiency for tetracycline and Cu2+ of 98.49% and 99.90%, respectively. The excellent photocatalytic degradation performance for tetracycline in compound wastewater mainly ascribed to the enhanced visible-light capture ability by hollow structure of CN/MS-V-3, formation 1O2 and ·OH, and the cycle of Cu2+/Cu+ and Mo2+/Mo4+ induced the fast electrons transport. The contamination of Cu2+ in wastewater can play as an accelerator in the CN/MS-V-3 reaction system to improve the degradation performance of tetracycline. DFT results indicated that CN/MS-V-3 heterojunction was formed by combination of side surface MoS2–V and g-C3N4, and the Cu adsorption onto CN/MS-V-3 showed a potential formation of Cu–N and Cu–S bonds. In addition, the tetracycline degradation pathways and evaluation of toxicity of intermediates were also proposed. This work not only provides a promising technology for antibiotic and heavy metal combined contamination removal, but also a clever use of Cu variable valence to accelerate electron cycling to improve the removal performance of the CN/MS-V-3.
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