材料科学
钝化
光电子学
兴奋剂
图层(电子)
异质结
光伏系统
硅
氧化物
晶体硅
电接点
量子隧道
电压
太阳能电池
堆栈(抽象数据类型)
工程物理
多晶硅耗尽效应
光伏
纳米技术
低压
作者
Sheshicheng Chen,Kun Cao,Zhenhai Yang,Cuiwen Guo,Jiwei Feng,Huiyun Gu,Shanshan Yang,Pengfei Lv,Yi Qin,Xiaopeng Zhang,Ruihao An,Zunke Liu,Haojiang Du,Wei Liu,Xukai Zhao,Haipeng Yin,Xiulin Jiang,Zi Ouyang,Yuheng Zeng,J P Ye
摘要
ABSTRACT Although tunnel oxide passivating contact (TOPCon) solar cells have become a leading photovoltaic technology, the traditional single‐layer polysilicon (poly‐Si) structure remains a critical challenge in balancing parasitic absorption, passivation performance, and firing‐through degradation. To address this issue, we propose an ultrathin three‐layer poly‐Si stack (60 nm) separated by ultrathin SiO x interlayers, combined with a tailored rear silver paste. Notably, the outer poly‐Si layer with higher phosphorus doping facilitates electrical contact during firing‐through, while the inner poly‐Si layer with lower phosphorus doping exhibits higher crystallinity, facilitating passivation quality; meanwhile, the intermediate‐buffer poly‐Si ensures strong robustness. Moreover, a specific silver paste formulation with low corrosivity and excellent rheological properties enables the formation of low‐contact resistance. The resulting TOPCon devices achieve a certified efficiency of 26.07% and an exceptional open‐circuit voltage of 748.6 mV, representing a milestone approaching that of silicon heterojunction cells. Moreover, this design effectively reduces parasitic absorption, yielding a high bifaciality of 88.6%.
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