Surface Modification of Poly(biphenyl dianhydride-para-phenylene diamine) (BPDA-PDA) and Poly(pyromellitic dianhydride-oxydianiline) (PMDA-ODA) Polyimides with UV Photo-Oxidation

Poly(biphenyl dianhydride-para-phenylene diamine) (BPDA-PDA), Upilex-S, and poly(pyromellitic dianhydride-oxydianiline) (PMDA-ODA), Kapton HN, polyimides (PIs), were exposed to 253.7 nm and broad band radiation centered at 300 nm UV radiation which photo-activated the polymer surfaces in the presence of oxygen at atmospheric pressure. XPS analysis showed an increase in the O/C ratio on the modified surfaces which appeared mostly as the carbonyl moiety, although, treated Upilex-S samples also displayed an increase in C–O–C groups. The O/C ratio saturated more quickly for Upilex-S than Kapton. Good practical adhesion of sputtered Cu to the treated surfaces occurred at short treatment times while extensive exposure resulted in cohesive failure within the substrates at shorter treatment times for Upilex-S than Kapton.