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APDBD Plasma Polymerized PNIPAm Coatings with Controlled Thickness via Spin Coating Technique

材料科学 涂层 等离子体 聚合 等离子体聚合 旋涂 化学工程 复合材料 聚合物 物理 核物理学 工程类
作者
Hakim Ssekasamba,X. Chen,Hong Cui,Xiaoliang Tang,Qiuming Gao,Xihua Lu,Qingsong Yu
出处
期刊:Coatings [MDPI AG]
卷期号:15 (7): 762-762
标识
DOI:10.3390/coatings15070762
摘要

Thermosensitive Poly(N-isopropylacrylamide) (PNIPAm) films were synthesized via atmospheric pressure dielectric barrier discharge (APDBD) plasma polymerization. In order to control the thickness of the films, a spin coating technique was used during the deposition of N-isopropylacrylamide (NIPAM) monomer solution onto several glass substrates. We used the coefficient of determination (R-square value) in linear regression to investigate the significance and optimize spin coating parameters during the fabrication of NIPAM coatings before exposure to APDBD plasma to ensure reproducible and uniform film properties. The spin coating parameters investigated in this study include spin speed, spin time, and NIPAM solution concentration with R-square values of 0.978, 0.946, and 0.944, respectively. Also, as a result of the thermosensitive nature of NIPAM, the spin coating operating conditions of temperature and humidity were maintained at 39.0 °C and 15%, respectively. During the APDBD plasma polymerization, argon was used as the discharge gas, and the distance between the two parallel electrodes and plasma frequency were maintained at 5.0 mm and 17 kHz, respectively. The plasma exposure time required for polymerization of PNIPAm coatings was optimized to 60 s. Also, the results showed that a coating with minimal defects had an optimal thickness of 5.18 μm, fabricated under conditions of 90 wt.% NIPAM concentration, spin speed of 4000 rpm, and total spin time of 7 s.
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