范德瓦尔斯力
抗弯刚度
材料科学
抗弯刚度
石墨烯
弯曲
氮化硼
刚度(电磁)
二硫化钼
刚度
剪切模量
密度泛函理论
复合材料
凝聚态物理
结晶学
纳米技术
计算化学
化学
分子
物理
有机化学
作者
Yingchun Jiang,Srividhya Sridhar,Zihan Liu,Dingli Wang,Huimin Zhou,Jia Deng,Huck Beng Chew,Changhong Ke
摘要
Continuum mechanics break down in bending stiffness calculations of mono- and few-layered two-dimensional (2D) van der Waals crystal sheets, because their layered atomistic structures are uniquely characterized by strong in-plane bonding coupled with weak interlayer interactions. Here, we elucidate how the bending rigidities of pristine mono- and few-layered molybdenum disulfide (MoS2), graphene, and hexagonal boron nitride (hBN) are governed by their structural geometry and intra- and inter-layer bonding interactions. Atomic force microscopy experiments on the self-folded conformations of these 2D materials on flat substrates show that the bending rigidity of MoS2 significantly exceeds those of graphene or hBN of comparable layers, despite its much lower tensile modulus. Even on a per-thickness basis, MoS2 is found to possess similar bending stiffness to hBN and is much stiffer than graphene. Density functional theory calculations suggest that this high bending rigidity of MoS2 is due to its large interlayer thickness and strong interlayer shear, which prevail over its weak in-plane bonding.
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