Characteristic of ITO and MgO surfaces after pin-to-plate type atmospheric plasma treatment using CDA

Summary form only given, as follows. Recent studies on the surface treatment of various materials are concentrated on the atmospheric pressure by using He/O/sub 2/ plasma instead of low pressure plasmas due to the various advantages of atmospheric pressure plasma. In this study, pin-to-plate type atmospheric pressure plasmas were generated using clean dry air (CDA) by low frequency (kHz) power supply between dielectric covered electrodes and were used to remove contamination on the ITO and MgO surfaces and to investigate the change of surface composition and the surface roughness of ITO and MgO after the atmospheric pressure plasma treatment.