绝缘体上的硅
材料科学
光电子学
插入损耗
光子学
CMOS芯片
硅光子学
硅
带宽(计算)
等离子体增强化学气相沉积
光学
光学滤波器
电信
计算机科学
物理
作者
Ying Huang,Junfeng Song,Xianshu Luo,Tsung-Yang Liow,Guo‐Qiang Lo
出处
期刊:Optics Express
[Optica Publishing Group]
日期:2014-09-02
卷期号:22 (18): 21859-21859
被引量:105
摘要
We demonstrated a low-loss CMOS-compatible multi-layer platform using monolithic back-end-of-line (BEOL) integration. 0.8dB/cm propagation loss is measured for the PECVD Si₃N₄ waveguide at 1580nm wavelength. The loss is further reduced to 0.24dB/cm at 1270nm wavelength, justifying the platform's feasibility for O-band operation. An inter-layer transition coupler is designed, achieving less than 0.2dB/transition loss across 70nm bandwidth. This is the lowest inter-layer transition loss ever reported. A thermally tuned micro-ring filter is also integrated on the platform, with performance comparable to similar device on SOI platform.
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