阈下传导
阈值电压
光电子学
材料科学
阈下斜率
高电子迁移率晶体管
二极管
肖特基二极管
晶体管
氮化镓
宽禁带半导体
电压
电气工程
纳米技术
图层(电子)
工程类
作者
Benoit Bakeroot,Steve Stoffels,Niels Posthuma,D. Wellekens,Stefaan Decoutere
标识
DOI:10.1109/ispsd.2019.8757629
摘要
The measured values of the threshold voltage of AlGaN/GaN high-electron-mobility transistors (HEMTs) with a p-GaN gate are generally more positive than what is expected from a classical HEMT. The transfer characteristics exhibit subthreshold slopes which are higher compared to the standard 60 mV per decade at room temperature. The higher threshold voltage values and subthreshold slopes are related to the specific structure of the p-GaN gate, consisting of two back-to-back diodes. The dominating diode-either the metal to p-GaN Schottky diode or the p-GaN/AlGaN barrier/GaN channel diode-dictates how much gate current flows, determines the subthreshold behavior, and, thus also the threshold voltage. The trade-off between the threshold voltage and the subthreshold slope is discussed revealing the intricate dynamic relation between those two device metrics and the gate leakage current.
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