外延
肖特基二极管
电容
MOSFET
材料科学
二极管
降级(电信)
光电子学
碳化硅
电容器
电子工程
电气工程
化学
纳米技术
工程类
电极
晶体管
电压
物理化学
冶金
图层(电子)
作者
Shinsuke Harada,Yusuke Kobayashi,Shinya Kyogoku,Takahiro Morimoto,Tomoyuki Tanaka,Masahiro Takei,Hajime Okumura
标识
DOI:10.1109/iedm.2018.8614670
摘要
A 1.2 kV-class superjunction (SJ) UMOSFET was realized using a multi-epitaxial growth method. The dynamic characteristics were characterized, and the potential of a product level device was identified for the first time. The switching characteristics with Schottky barrier diode showed no degradation in spite of the large drain-source capacitance (C DS ). The reverse recovery characteristics of the body diode exhibited a soft recovery which may originate from the large C DS and the short lifetime of minority carrier. A high short circuit capability comparable to a non-SJ device was demonstrated.
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