Discharge dynamics, plasma kinetics and gas flow effect in argon–acetylene discharges

乙炔 等离子体 离解(化学) 电离 化学 体积流量 离子 动力学 分析化学(期刊) 分子动力学 原子物理学 机械 环境化学 物理化学 计算化学 有机化学 物理 量子力学
作者
Gautier Tetard,Armelle Michau,Swaminathan Prasanna,Jonathan Mougenot,Pascal Brault,K. Hassouni
出处
期刊:Plasma Sources Science and Technology [IOP Publishing]
卷期号:30 (10): 105015-105015 被引量:15
标识
DOI:10.1088/1361-6595/ac2a17
摘要

Abstract We investigated capacitively coupled Ar/C 2 H 2 RF plasmas with a 1D fluid model that couples a 13.56 MHz discharge module, a long timescale chemical module and a flow transport module. A new solution procedure was developed in order to accurately describe the coupling between the short timescale discharge dynamics and the long characteristic time processes that play a major role in the molecular growth of reactive species. The plasma was simulated for different inlet gas configurations and flowrates. We showed that for a showerhead configuration one may distinguish two situations. For short residence time the plasma was strongly electronegative in the very center of the discharge gap and dominated by large hydrocarbon positive and negative ions. In this situation the acetylene conversion, although moderate, lead to a significant molecular growth. For long residence time, although C 2 H 2 underwent a total conversion, the products of the primary C 2 H 2 dissociation process were consumed by surface deposition which reduced drastically the molecular growth in the short gap discharge considered here. Whatever the conditions, we confirmed the key-role of Ar* in the acetylene conversion, ionization kinetics as well as the subsequent molecular growth for neutral and charged species. We also showed that remote feed gas and showerhead configurations predicted similar results at low flowrate. At larger flowrate the two configurations presented some discrepancy. Especially H 2 density was much larger for the remote feed gas configuration, which affected the overall plasma behavior. Our results highlight that realistic gas-flow models are essential for an accurate description of acetylene conversion in Ar/C 2 H 2 plasma.
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