涂层
材料科学
溅射
内容(测量理论)
溅射沉积
方向(向量空间)
相(物质)
铜
冶金
结晶学
复合材料
化学工程
分析化学(期刊)
纳米技术
薄膜
化学
数学
色谱法
几何学
有机化学
工程类
数学分析
作者
Shuyong Tan,Xuhai Zhang,Rui Zhen,Zhangzhong Wang
标识
DOI:10.1142/s0218625x19501130
摘要
CrCuN coatings were deposited using double target co sputtering by DC pulsed magnetron reactive sputtering. The Cu content increases from 0.7[Formula: see text]at.% to 5.5[Formula: see text]at.% with the increase of Cu target current from 0.08 to 0.24[Formula: see text]A. The influence of Cu content on preferred orientation and properties of CrCuN coatings was investigated. The results show that CrCuN coatings are mainly composed of CrN phase. Except for the coating containing 4.2[Formula: see text]at.% Cu, the other CrCuN coatings show CrN(111) preferred orientation. All the coatings have loose structure, which is chiefly responsible for unsatisfactory hardness. The oriented growth plays an important role in the change of coating hardness with Cu content.
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