石墨烯
光电流
响应度
光电子学
频道(广播)
材料科学
晶体管
石墨烯纳米带
光子
纳米技术
电压
物理
光电探测器
光学
电信
计算机科学
量子力学
作者
Fengnian Xia,Thomas Mueller,Roksana Golizadeh-Mojarad,Marcus Freitag,Yu-Ming Lin,J. C. Tsang,Vasili Perebeinos,Phaedon Avouris
出处
期刊:Nano Letters
[American Chemical Society]
日期:2009-02-09
卷期号:9 (3): 1039-1044
被引量:511
摘要
We measure the channel potential of a graphene transistor using a scanning photocurrent imaging technique. We show that at a certain gate bias, the impact of the metal on the channel potential profile extends into the channel for more than one-third of the total channel length from both source and drain sides; hence, most of the channel is affected by the metal. The potential barrier between the metal-controlled graphene and bulk graphene channel is also measured at various gate biases. As the gate bias exceeds the Dirac point voltage, VDirac, the original p-type graphene channel turns into a p-n-p channel. When light is focused on the p-n junctions, an impressive external responsivity of 0.001 A/W is achieved, given that only a single layer of atoms are involved in photon detection.
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