EPE-aware process optimization for scanner dose and overlay in DRAM use case

In this paper the use of the EPE metric directly in the process optimization method for a DRAM use case has been researched. We show that EPE-aware optimization, using scanner dose and overlay control sub-recipes, is outperforming conventional optimization in terms of EPE Dies in Spec. Hence, it can be expected that also device yield can be improved by EPE-aware control.