Improving the crystallinity and texture of oblique-angle-deposited AlN thin films using reactive synchronized HiPIMS

Many technologies, such as surface-acoustic-wave (SAW) resonators, sensors, and piezoelectric MEMS require highly-oriented and textured functional thin films. The best results are typically achieved for on-axis sputter geometries, but in some scenarios, this is not feasible, such as during co-deposition from multiple magnetrons or when coating substrates with high aspect ratios. Ionized physical vapor deposition (PVD) techniques such as HiPIMS can be used to accelerate the film-forming species onto the growing film using substrate-bias potentials, thus increasing ad-atom mobility and film texture. However, gas-ion incorporation can limit the feasibility of such synthesis approaches for defect-sensitive functional thin films. This work reports on the oblique-angle deposition of highly textured, c-axis oriented AlN (0002) films using reactive metal-ion synchronized HiPIMS. AlN thin films deposited using direct current magnetron sputtering (DCMS) and HiPIMS are discussed for comparison and the effect of ion irradiation through substrate biasing is investigated. We find that combining HiPIMS with a moderate substrate bias of only −30 V improves the crystalline quality and texture of the films significantly, while the process-gas incorporation and point defects formation can be further reduced by synchronizing the negative substrate bias potential to the Al-rich fraction of each HiPIMS pulse. In addition to a pronounced out-of-plane texture, the films show uniform polarization of the grains making this synthesis route suitable for piezoelectric applications. While the compressive stress in the films is still comparatively high, the results already demonstrate, that metal-ion synchronized HiPIMS can yield promising results for the synthesis of functional thin films under oblique-angle deposition conditions - even with low substrate-bias potentials.