去相
弱局部化
散射
电子
磁电阻
凝聚态物理
薄膜
电子散射
电子定域函数
半导体
兴奋剂
材料科学
化学
物理
纳米技术
光学
磁场
光电子学
量子力学
作者
Zonghui Gao,Kuang-Hong Gao,Yang Yang,Zhiqing Li
标识
DOI:10.1016/j.physb.2022.414290
摘要
We have systematically investigated the electron dephasing processes of the thin and thick Ta-doped SnO2 films. All samples exhibit electron transport characteristics of degenerate semiconductors. At low temperature T (below ∼70 K), the weak-localization-induced negative magnetoresistance (MR) is observed. For the thick films with the thicknesses of ∼300 nm, the observed MR can be well described by three-dimensional weak-localization theory. The electron dephasing rate 1/τφ varies linearly with T3/2, indicating that the electron–electron scattering dominates the electron dephasing process. This is different from the common observation that the electron–phonon scattering is the main dephasing process for electrons in three-dimensional disordered conductors. For the thin films with the thicknesses of ∼30 nm, the MR can be well described by two-dimensional weak-localization theory. By analyzing the electron dephasing rate as a function of T, we find that both large- and small-energy-transfer electron–electron scattering processes play an important role in the electron dephasing.
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