P‐267: Late‐News Poster: Strategies to Develop Highly Reactive Red Photoresists via Modulation of the Exposure and Developing Processes

This study focuses on improving the manufacturing efficiency of thin‐film transistor liquid crystal displays (TFT‐LCD) by developing color photoresists (CPRs) with higher reactivity and faster photocuring. It was found that adjusting the composition of photoinitiators, resins, and monomers led to a fast‐curing red photoresist with high sensitivity. The study explored the effects of composition on pattern integrity, linewidth, and film thickness. By optimizing the ratio of these components, complete photocuring was achieved at an exposure energy of 30 mJ, maintaining target linewidth and minimizing undercut (approximately 0.6 µm). This approach balances photocuring and development properties, providing a strategy for creating highly reactive CPRs and guiding future photoresist development.