化学
反应速率常数
量子产额
产量(工程)
降级(电信)
羟基自由基
动力学
光解
光化学
动能
酚类
激进的
吸收(声学)
核化学
有机化学
材料科学
荧光
物理
复合材料
电信
冶金
量子力学
计算机科学
作者
Min Zhao,Ting Li,Yizhan Zhang,Jiaming Gan,Yijun Zhao,Xin Yu,Guofeng Zhu
标识
DOI:10.1016/j.jclepro.2023.140255
摘要
Advanced oxidation technology of KrCl excimer lamp activated H2O2 (UV222/H2O2) have been received widespread attention in the field of water treatment recently, due to the higher radical yield and environmentally friendly nature compared to UV254/H2O2. In this investigation, four representative parahalogenated phenols (HPs) degradation kinetic and mechanisms by UV222 alone and UV222/H2O2 were studied, respectively. The results showed that the photolysis rate constants (kobs) under UV222 followed the order of p-Chlorophenol (p-CP) > p-Fluorophenol (p-FP) > p-Bromophenol (p-BP) > p-Iodophenol (p-IP), and the degradation rate constants (kobs) by UV222/H2O2 followed the order of p-FP > p-CP > p-BP > p-IP. The molar absorption coefficient (ε222nm) and quantum yield (Φ222nm) of HPs photolysis were measured. Kinetic model simulating results are in fair agreement with the experimental results. Through HPLC-MS analysis and DFT calculation, the impact of halogen ions on the degradation kinetics of HPS by UV222 and UV222/H2O2 was found, the possible reaction pathways and mechanisms were proposed. Compared with UV254/H2O2 for removing p-CP, UV222/H2O2 was much more energy efficient.
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