多孔硅
光致发光
形态学(生物学)
材料科学
多孔性
化学工程
硅
多孔介质
蚀刻(微加工)
复合材料
冶金
光电子学
地质学
古生物学
图层(电子)
工程类
作者
Meng-Ting Tsai,Yi‐Chen Lee,Yo‐Sheng Lin,Vincent K. S. Hsiao,Chih-Chien Chu
出处
期刊:Materials
[MDPI AG]
日期:2024-02-21
卷期号:17 (5): 989-989
摘要
Porous silicon (PSi) has promising applications in optoelectronic devices due to its efficient photoluminescence (PL). This study systematically investigates the effects of various organic solvents and their concentrations during electrochemical etching on the resulting PL and surface morphology of PSi. Ethanol, n-butanol, ethylene glycol (EG) and N,N-dimethylformamide (DMF) were employed as solvents in hydrofluoric acid (HF)-based silicon etching. The PL peak position exhibited progressive blue-shifting with increasing ethanol and EG concentrations, accompanied by reductions in the secondary peak intensity and emission linewidth. Comparatively, changes in n-butanol concentration only slightly impacted the main PL peak position. Additionally, distinct morphological transitions were observed for different solvents, with ethanol and n-butanol facilitating uniform single-layer porous structures at higher concentrations in contrast to the excessive etching caused by EG and DMF resulting in PL quenching. These results highlight the complex interdependencies between solvent parameters such as polarity, volatility and viscosity in modulating PSi properties through their influence on surface wetting, diffusion and etching kinetics. The findings provide meaningful guidelines for selecting suitable solvent conditions to tune PSi characteristics for optimized device performance.
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