基质(水族馆)
计算机科学
性能增强
材料科学
光电子学
地质学
医学
海洋学
物理医学与康复
标识
DOI:10.1109/icicdt56182.2022.9933073
摘要
For decades, Smart Cut TM technology has offered a wide range of engineered substrates produced in high volume manufacturing.It opened a large product portfolio, including numerous silicon on insulator (SOI) generations, allowing 2.5D/3D device integration and opening the path to enhanced silicon carbide materials.In this talk, we will review the main features of the Smart Cut TM process, and focus on some of the specificities attached to its applications.Among other examples, we will consider the atomic layer thickness control allowing fully-depleted device ultra-low variability, or the new ultra-highly conductive SmartSIC TM materials.
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