Thermal Stability of Gallium-Doped Zinc Oxide Thin Film on Glass Substrates by an RF Sputtering Process

The effects of a heat treatment on the structural and electrical properties of GZO thin films grown by RF magnetron sputtering were investigated. The heat treatment involved temperatures in the range from 200 degrees C to 500 degrees C under air. As the temperature was increased, the electrical properties of GZO thin films increased exponentially and the surface morphology was drastically altered. The effect of temperature is discussed based on electrical and structural characterization of the materials.