材料科学
高功率脉冲磁控溅射
电致变色
光电子学
溅射沉积
X射线光电子能谱
电致变色装置
溅射
薄膜
化学工程
纳米技术
电极
工程类
物理化学
化学
作者
Hamed Najafi‐Ashtiani,Behnam Akhavan,Fengjuan Jing,M.M.M. Bilek
标识
DOI:10.1021/acsami.9b00191
摘要
The growing applications of electrochromic (EC) devices have generated great interest in bifunctional materials that can serve as both transparent conductive (TC) and EC coatings. WO3/Ag/WO3 (WAW) heterostructures, in principle, facilitate this extension of EC technology without reliance on an indium tin oxide (ITO) substrate. However, these structures synthesized using traditional methods have shown significant performance deficiencies. Thermally evaporated WAW structures show weak adhesion to the substrate with rapid degradation of coloration efficiency. Improved EC durability can be obtained using magnetron sputtering deposition, but this requires the insertion of an extra tungsten (W) sacrificial layer beneath the external WO3 layer to prevent oxidation and associated loss of conductivity of the silver film. Here, we demonstrate for the first time that a new method, known as high-power impulse magnetron sputtering (HiPIMS), can produce trilayer bifunctional EC and TC devices, eliminating the need for the additional protective layer. X-ray photoelectron spectroscopy and X-ray diffraction data provided evidence that oxidation of the silver layer can be avoided, whilst stoichiometric WO3 structures are achieved. To achieve optimum WAW structures, we tuned the partial pressure of oxygen in the HiPIMS atmosphere applied for the deposition of WO3 layers. Our optimized WO3 (30 nm)/Ag (10 nm)/WO3 (50 nm) structure had a sheet resistance of 23.0 ± 0.4 Ω/□ and a luminous transmittance of 80.33 ± 0.07%. The HiPIMS coatings exhibited excellent long-term cycling stability for at least 2500 cycles, decent switching times (bleaching: 22.4 s, coloring: 15 s), and luminescence transmittance modulation (ΔT) of 34.5%. The HiPIMS strategy for the fabrication of ITO-free EC coatings for smart windows holds great promise to be extended to producing other metal–dielectric composite coatings for modern applications such as organic light-emitting diodes (OLEDs), liquid crystals, and wearable displays.
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