材料科学
脉冲激光沉积
扫描电子显微镜
无定形固体
薄膜
微观结构
沉积(地质)
锂(药物)
电化学
分析化学(期刊)
化学工程
托尔
纳米技术
复合材料
电极
化学
结晶学
物理
工程类
内分泌学
物理化学
古生物学
热力学
生物
医学
色谱法
沉积物
作者
Min Park,Guoxiu Wang,Huan Liu,Shi Xue Dou
标识
DOI:10.1016/j.electacta.2006.01.045
摘要
Si thin films were deposited directly on stainless steel substrates that act as current collectors using the pulsed laser deposition (PLD) technique. Amorphous Si films of different thicknesses were obtained at the Ar gas pressure of 5 × 10−5 Torr and a temperature of 500 °C but different deposition times. The microstructure and morphology of the films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD) and atomic force microscopy (AFM). The anodic electrochemical performance of the films was examined in the range of 0.005–1.5 V, which revealed excellent cyclic stability without any large capacity fade up to the 70th cycle. The PLD process was suitable for improving the density and adhesion behavior of the films.
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