高电子迁移率晶体管
击穿电压
材料科学
光电子学
肖特基二极管
氮化镓
电压
电气工程
电场
肖特基势垒
制作
阈值电压
功率(物理)
宽禁带半导体
晶体管
工程类
物理
纳米技术
二极管
病理
替代医学
量子力学
医学
图层(电子)
作者
Hao Wu,Fu Xiaojun,Shengdong Hu
出处
期刊:2021 International Conference on Electrical, Communication, and Computer Engineering (ICECCE)
日期:2021-06-12
卷期号:: 1-5
被引量:4
标识
DOI:10.1109/icecce52056.2021.9514197
摘要
GaN HEMTs are potential devices for future utilizations in power electronic applications. In this paper, an enhancement mode GaN HEMT power device is introduced. We present a schottky metal/p-type GaN gate to obtain positive threshold voltage and a source field plate to balance the electric field. Using Sentaurus TCAD as the simulation tool, the simulated breakdown voltages of the device with and without source field plate are 795V and 239V at L GD =7µm, respectively. In order to obtain the highest breakdown voltage, the structure of the source field plate is analyzed and optimized before fabrication. The tested breakdown voltage of the fabricated device is 725V, and the tested threshold voltage is 1.15V.
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