Photosensitive Polyimides

聚酰亚胺 材料科学 微电子 聚合物 光敏性 高分子化学 光电子学 纳米技术 复合材料 图层(电子)
作者
一晃 堀江,Takashi Yamashita
标识
DOI:10.1201/9780203743423
摘要

Preface Introduction to Photopolymers and Microelectronics Introduction Photosensitive Polymers Polymers for Microelectronics References Applications of Polyimides in Electronics Introduction Commercially Available Photosensitive Polyimides Performance of Commercial Photosensitive Polyimides Applications Outlook References Thermal and Mechanical Properties of Polyimides and Control of High-Order Structures Introduction Thermal and Mechanical Properties of Aromatic Polyimides Control of High-Order Structures of Aromatic Polyimides References Electronic Configuration of Polyimides and Their Photophysical Processes Introduction Color of Polyimide Films Emission of Polyimide Films Photophysical Processes in Polyimide Model Compounds Photochemistry of Polyimide Model Compounds Other Related Emission Behavior of Imide Compounds and Their Analogue Photoconductivity of Polyimide Films References Design of Photosensitive Polyimide Precursor Systems Introduction Structure and Reaction of Photosensitive Polyimide Precursors Properties of Polyimides Formed from Photosensitive Polyimide Precursors Conclusion References Intrinsically Photosensitive Polyimides Introduction Structure and Reaction of Intrinsically Photosensitive Polyimides Photoreactivity Mechanism and Molecular Design for Improvement of Photosensitive Polyimides References Photosensitive Polyimides Based on Chemical Amplification Mechanism Introduction Amplification Process for Photosensitive Materials Chemical Amplification Synthesis of Polyimides Characteristics of Protected Polyimides 6F-t-BOC and 6F-THP Lithographic Performance of Protected Polyimides Acidolytic Deprotection Rate in Film Matrices Photochemical Reaction of PAG in Solid Films Properties of 6F-t-BOC and 6F-THP References Electron Beam Lithography of Polyimides Introduction Characteristics of Radiation Effects of Polyimides Molecular Design of Electron-Beam Sensitive Polyimides Mechanism of Electron-Beam Irradiation of Polyimides References Processing of Polyimides and Related Topics Introduction Representative Electronic Applications Deposition Methods Patterning of Conventional Polyimides Processing of Photosensitive Polyimides Processes for High-Density Multilevel Metallization References Applications of Polyimides to Photonic Devices Introduction Nonlinear Optical Phenomena Organic versus Inorganic Nonlinear Optical Materials EO Effect in Polymers and Use for Devices Requirements for Polymers in Photonics Polyimide-Based EO Devices NLO Chromophore Requirements for Use in EO Polymer Devices Photosensitive Polyimides in Photonics Higher Levels of Integration: Advantages of Polymers Summary References 39 Tables, 208 Figures Numerous tables and graphs provide extensive quantitative data on polyimides for electronic applications. The many schematics and micrographs illustrate materials, processes and devices. Here is a small sampling. Tables: Patterning and thermal properties of commercially available photosensitive polyimides Mechanical and electrical properties of commercially available photosensitive polyimides Chemical structures of commercially available polyimide films Required properties of photosensitive poyimides Applications of polyimide for electronic devices Materials requirements for EO polymer devices Micrographs: Memory devices on a silicon wafer, the cell arrays are protected by thick polyimide patterns Layout of a liquid crystal display with polyimide alignment layers SEM picture of line and space pattern formed with 6F-THP Schematics: Chemical principle and processing steps for direct production of PI-patterns Polyimide patterning processes High temperature post-exposure process using photosensitive polyimide precursors Comparison of polyimide patterning processes between polyimides with and without photosensitivity Process flow for planarization with lift-off technique Examples of applications for polymers in photonic systems
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