Processing Research on High Purify Titanium Growth by Improved Thermal Decomposition of Titanium Iodides

The lower valent titanium iodide was substituted for the higher valent titanium iodide to get 4N high purity titanium because it had a superior temperature ranges of source area and deposition area.The influencing factors,such as the temperature ranges of source area and deposition area,the high valent titanium iodides,the impurity of the raw titanium and the vapor pressure of the lower valent titanium iodide,on deposition rate of titanium were analyzed.The results show that a ideal deposition rate of high purify titanium was obtained.