A review on various techniques implemented for the synthesis of SiliconCarbo-Nitride (SiCN) coatings

The investigation of nanotribological properties of SiCN thin film coating is paramount important in order to develop the basic understanding regarding its applications in small scale nanostructure device and other industrial applications. The applications of SiCN in different domains such as structural ceramics, MEMS, hard protective coatings, and electronic materials are a vital aspect regarding their higher service life and lower manufacturing cost. To achieve the desirable properties of SiCN research groups have employed various synthesis techniques such as PECVD, PVD, HWCVD sputtering etc. Therefore this review article is focused in summarizing the various synthesis techniques employed for the synthesis of SiCN thin film coatings.