功勋
磁滞
异质结
材料科学
阈下斜率
光电子学
击穿电压
场效应晶体管
阈值电压
凝聚态物理
晶体管
电气工程
电压
物理
工程类
作者
Chenlu Wang,Hong Zhou,Jincheng Zhang,Wenxiang Mu,Jie Wei,Zhitai Jia,Xuefeng Zheng,Xiaorong Luo,Xutang Tao,Yue Hao
摘要
In this Letter, we report on establishing high performance hysteresis-free and μs-switching depletion/enhancement-mode (D/E-mode) β-Ga2O3 heterojunction (HJ) field effect transistors (FETs) with the state-of-art power figure-of-merit (P-FOM). By optimizing the p-NiOx/n-Ga2O3 interface and n-Ga2O3 recess technology, a positive threshold voltage (VT) as well as a low subthreshold slope can be substantially achieved. The trade-off between the on-resistance (Ron,sp) and breakdown voltage (BV) is improved by incorporation of T-shaped NiOx, resulting in the Ron,sp of 6.24/13.75 mΩ cm2 and the breakdown voltage (BV) of 2145/1977 V for D/E-mode devices and yielding the P-FOM = BV2/Ron,sp to be 0.74/0.28 GW/cm2. To the best of all the authors' knowledge, those P-FOMs are the highest ones among all published lateral Ga2O3 FETs. Benefited from the high-quality interface, a negligible hysteresis of 4 mV and μs-switching can be essentially achieved, showing the great promise of Ga2O3 HJ-FETs for future high-power, high-efficiency, and high-speed power electronics.
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