Fabrication and characterization of Co2MnSi thin film with an extreme low damping constant

This study deals with the fabrication and magnetic characterization of Co2MnSi thin film with an extremely low Gilbert damping constant. The thin film is prepared by dc magnetron sputtering onto MgO (001) substrate using stoichiometric alloy target and post-annealed at 500°C for 1 h. X-ray diffraction and high-resolution transmission electron microscopy are used to determine film structure and microstructure. The hysteresis loops and saturated magnetization are measured by alternating gradient magnetometry while the magnetization dynamics are studied by ferromagnetic resonance at 5-40 GHz.