A facile fabrication of highly dispersed CeO2/SiO2 aerogel composites with high adsorption desulfurization performance

吸附 气凝胶 噻吩 化学工程 弗伦德利希方程 化学 解吸 烟气脱硫 朗缪尔 无机化学 有机化学 材料科学 复合材料 工程类
作者
Luxia Yin,Jiacheng Xu,Bo Zhang,Leigang Wang,Wanyi Tao,Teng Xiao,Wensheng Ning,Ze Zhang
出处
期刊:Chemical Engineering Journal [Elsevier]
卷期号:428: 132581-132581 被引量:47
标识
DOI:10.1016/j.cej.2021.132581
摘要

Abstract A simple, low energy consumption and environment-friendly strategy was used to prepare highly dispersed CeO2/SiO2 aerogel composites with different molar ratio of Si/Ce via sol-gel method and subsequently drying under the ambient pressure, in which the oxidation of Ce3+ species into Ce4+ species could be achieved by adding H2O2. The structural and surface properties of adsorbents were analyzed by XPS, XRD, FT-IR, Py-IR, SEM, XRF and N2 adsorption-desorption isotherm. The adsorption desulfurization performances of CeO2/SiO2 for thiophenic compounds from simulated gasoline and model aromatic products were investigated and compared by the breakthrough and batch adsorption experiments. As a result, the weak Lewis acid centers appeared on the surface of CeO2/SiO2. Among them, CeO2/SiO2 with a Si/Ce of 25 performed best, the adsd by Duanpacity for TP from simulated gasoline (n-heptane) was 10.9 mg-S/gads, followed by model aromatic products (benzene, 10.6 mg-S/gads; p-xylene, 10.1 mg-S/gads), however, the difference between them was slight, attributed to the formation of S-Ce bonding instead of C-Ce bonding. The very weak competitive adsorption of benzene and p-xylene with thiophene originated from the weak Lewis acid-base interaction. After the fourth solvent washing regeneration, the breakthrough adsorption capacity of regenerated CeO2/SiO2-25 still remained 60% of the fresh one. The equilibrium adsorption data of CeO2/SiO2-25 for thiophene were well fitted by Langmuir and Freundlich model, and the adsorption for TP was more favorable at the higher temperature. The adsorption process of CeO2/SiO2-25 was well fitted by pseudo-second-order kinetic model, which was spontaneous, endothermic and the freedom degree increased. The solvent (n-heptane, benzene, p-xylene) hardly influence the adsorption behavior of TP on CeO2/SiO2.
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