原子层沉积
等离子体
沉积(地质)
激进的
金属
氢
图层(电子)
材料科学
重组
氧化物
化学物理
化学工程
纳米技术
化学
物理
冶金
沉积物
生物
生物化学
古生物学
工程类
量子力学
基因
有机化学
作者
Maarit Kariniemi,Jaakko Niinistö,Marko Vehkamäki,Marianna Kemell,Mikko Ritala,Markku Leskelä,Matti Putkonen
出处
期刊:Journal of vacuum science & technology
[American Vacuum Society]
日期:2011-11-11
卷期号:30 (1)
被引量:63
摘要
In total, five metal oxide and one metal plasma-enhanced atomic layer deposition (PEALD) processes were studied with respect to the conformality of the coatings. The study reveals that also high aspect ratio structures (up to 60:1) can be coated conformally with remote PEALD. Oxides could relatively easily be deposited into demanding 3D structures with rather short cycle times but not the silver metal. The key factor in achieving excellent conformality seems to be that sufficient radical density is required to overcome the loss of radicals by recombination. In the case of metals where hydrogen plasma is applied the recombination of hydrogen radicals causes major difficulties in obtaining perfect conformality.
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