A method for compensating lithographic influence of EUV mask blank defects by an advanced genetic algorithm

Mask defectivity is a critical challenge to the high-volume production of extreme ultraviolet lithography (EUVL). In a similar way to the optical proximity correction (OPC), mask absorber pattern optimization could weaken the impact of defect on lithography. In order to compensate the amplitude and phase impact caused by the defects on the EUV mask blank, an advanced evolution strategy based on genetic algorithm (GA) combining with manufacturing rule check (MRC) is proposed to optimize the mask pattern. The influences of various defects on lithography are firstly summarized from mass simulation results, as well a novel method based on GA is proposed to compensate the negative impact by defects. Finally, the advantages of the proposed method in convergence efficiency and robustness are validated through comparing with differential evolution (DE) and original GA with simulations on contact patterns and logic patterns with the lithography simulator Sentaurus Lithography (Slitho).