材料科学
化学气相沉积
过渡金属
硫黄
纳米技术
制作
金属
六方晶系
沉积(地质)
可扩展性
化学工程
计算机科学
催化作用
结晶学
冶金
化学
有机化学
病理
古生物学
沉积物
工程类
医学
替代医学
生物
数据库
作者
Amina Zafar,Zainab Zafar,Weiwei Zhao,Jie Jiang,Yan Zhang,Yunfei Chen,Junpeng Lü,Zhenhua Ni
标识
DOI:10.1002/adfm.201809261
摘要
Abstract Chemical vapor deposition (CVD) has been developed as the most promising method for the growth of transition metal dichalcogenides (TMDs). In this work, the key factor determining the growth of TMDs is ascertained. A straightforward method is devised to directly achieve a holistic control of thickness, shape, and size of WS 2 flakes via a single parameter control, namely, the status of the S‐precursor. The thickness‐dependent growth of WS 2 flakes from mono‐ to quad‐layers is achieved by precise control of the feeding rate of elemental S‐precursor. Moreover, the explicit control over amount and exposure time of S‐precursor determines the most optimum combination of these parameters to tune the shape of the crystals from triangular to hexagonal with appropriate size. Hence, the experimental findings provide a promising strategy to engineer the growth evolution of WS 2 atomic layers by fine tuning of the sulfur supply, paving a pathway to scalable electronic and photonic devices.
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