Scheimpflug原理
镜头(地质)
计算机科学
线性回归
有晶状体人工晶状体
光学
角膜
折射误差
物理
视力
机器学习
作者
Jascha Wendelstein,Tun Kuan Yeo,Sarah Hinterberger,Theo Seiler,H. Burkhard Dick,Giacomo Savini,Achim Langenbucher,Suphi Taneri
标识
DOI:10.1016/j.ajo.2024.01.008
摘要
BackgroundAchieving precise refractive outcomes in phakic posterior chamber intraocular lens (pIOL) implantation is crucial for patient satisfaction. This study investigates factors affecting pIOL power calculations, focusing on myopic eyes, and evaluates the potential benefits of advanced predictive models.DesignRetrospective, single-center, algorithm improvement studyMethodsVarious variations with different effective lens position (ELP) algorithms were analyzed. The algorithms included a fixed constant model, and a multiple linear regression model and were tested with and without incorporation of the posterior corneal curvature (Rcp). Furthermore, the impact of inserting the postoperative vault, the space between the pIOL and the crystalline lens, into the ELP algorithm was examined, and a simple vault prediction model was assessed.ResultsIntegrating Rcp and the measured vault into pIOL calculations did not significantly improve accuracy. Transitioning from constant model approaches to ELP concepts based on linear regression models significantly improved pIOL power calculations. Linear regression models outperformed constant models, enhancing refractive outcomes for both ICL and IPCL pIOL platforms.ConclusionsThis study underscores the utility of implementing ELP concepts based on linear regression models into pIOL power calculation. Linear regression based ELP models offered substantial advantages for achieving desired refractive outcomes, especially in lower to medium power pIOL models. For pIOL power calculations in both pIOL platforms we tested with preoperative measurements from a Scheimpflug device, we found improved results with the LION 1ICL formula and LION 1IPCL formula. Further research is needed to explore the applicability of these findings to a broader range of pIOL designs and measurement devices.
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