Explainable artificial intelligence-based evidential inferencing on process faults in plasma etching

Abstract The fault detection and classification (FDC) modeling proposed in this study is a research approach that is intended to improve the performance of plasma process models by leveraging optical emission spectroscopy (OES) data containing plasma information (PI) and enhancing model interpretability using explainable artificial intelligence (XAI) algorithms. Status variable identification data that included normal and abnormal states of bias power, pressure, SF6 gas flow, and O2 gas flow were collected during a silicon etching process with SF6, O2 gas plasma. Additional variables were derived from the OES data and included additional PI, such as O and F radicals, which were computed using actinometry, and electron temperature and electron density computed using the line ratio method. By building a high-performance FDC model and interpreting its results using XAI algorithms, we propose solutions to the limitations of the FDC model in semiconductor plasma processes.