材料科学
缓冲器(光纤)
光电子学
兴奋剂
宽禁带半导体
氮化镓
电气工程
复合材料
图层(电子)
工程类
作者
Mohammad Ateeb Munshi,Mehak Ashraf Mir,Vipin Joshi,Rajarshi Roy Chaudhuri,Rasik Rashid Malik,Mayank Shrivastava
标识
DOI:10.1109/ted.2024.3462375
摘要
This work investigates the temperature-dependent electrostatic discharge (ESD) behavior of AlGaN/GaN HEMTs using a transmission line pulsing system, which becomes relevant under practical system-level scenario. Two devices with different carbon doping concentrations in the buffer are tested. It is observed that in low-carbon-doped devices, breakdown/failure voltage ( textitVtextBD ) decreases with increasing temperature, while in the high-carbon-doped devices, textitVtextBD shows a weak temperature dependence. A unique behavior is identified where the location of the channel electric field peak determines the temperature-dependent ESD breakdown behavior of the GaN HEMT devices. When the channel electric field peaks at the field plate edge (FPE), textitVtextBD shows a negative temperature coefficient, whereas it shows a weaker temperature dependence when the channel electric field shifts to the drain edge (DE). In situ and on-the-fly electrical and optical characterizations, such as electroluminescence (EL) microscopy and micro-Raman spectroscopy, and TCAD computations are performed to get deeper insights into the failure mechanisms. Postfailure analysis using scanning electron microscopy and focused ion beam (FIB) microscopy is also carried out to probe material-level implications on the failure of LC and HC devices. © 1963-2012 IEEE.
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