泄漏(经济)
截止频率
光电子学
材料科学
振荡(细胞信号)
砷化镓
电气工程
化学
工程类
生物化学
经济
宏观经济学
作者
Alain Sylvestre,P. Crozat,R. Adde,A. de Lustrac,Yun-Sik Jin,Jean‐Christophe Harmand,M. Quillec
出处
期刊:Electronics Letters
[Institution of Engineering and Technology]
日期:1993-11-25
卷期号:29 (24): 2152-2154
被引量:5
摘要
0.2μm Al0.48In0.52As/Ga0.47In0.53As LMHEMT on InP with an undoped GaInAs layer to reduce gate leakage have been realised and their DC and RF properties have been investigated cryogenic temperatures. The cutoff maximum frequencies oscillation Fmax up to 260 Hz are extrapolated at 50 K from the maximum unilateral gain (MUG) determined using S parameters measured up to 40 GHz. Evolution of gate leakage current and RF characteristics against gate and drain biases are presented between 50 and 300 K.
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